US Patent Issued to SCREEN Holdings on Jan. 20 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,690, issued on Jan. 20, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Katsuei Higashi (Kyoto, Japan), Toru Endo (Kyoto, Japan), Yusuke Takematsu (Kyoto, Japan), Keisuke Takagi (Kyoto, Japan) and Naohiko Yoshihara (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a first tank, a path including a first path, a first heater, a hydrogen peroxide supply path, and a controller. The first path allows sulfuric acid to be supplied therethrough from the first tank to a nozzle. The first heater heats a heating region of the ...