ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,665, issued on Feb. 10, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Temperature measurement method and heat treatment apparatus" was invented by Takahiro Kitazawa (Kyoto, Japan) and Hikaru Kawarazaki (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A temperature measurement method includes: a radiation temperature measurement step for detecting a brightness temperature of a semiconductor wafer from obliquely below the semiconductor wafer; an input parameter calculation step for calculating at least two input parameters from the brightness temperature detected in the radiation temperature measurement step, the at least two i...