ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,508,623, issued on Dec. 30, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).
"Substrate processing method" was invented by Yuji Tanaka (Kyoto, Japan), Masaya Asai (Kyoto, Japan), Masahiko Harumoto (Kyoto, Japan) and Koji Kaneyama (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mec...