US Patent Issued to SCREEN Holdings on Dec. 16 for "Substrate processing apparatus and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,099, issued on Dec. 16, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Mitsutoshi Sasaki (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a processing bath, a first lid member, an outer bath, a processing liquid introduction unit, a first gas supply unit, and a second gas supply unit. The processing bath stores a processing liquid in which a substrate is immersed. The first lid member covers an upper opening of the processing bath. The outer bath is provided outside of the processing bath and a processing l...