ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,397,323, issued on Aug. 26, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate cleaning device and substrate cleaning method" was invented by Shotaro Tsuda (Kyoto, Japan) and Ryohei Hokaku (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device includes a substrate holder that holds a substrate, a cleaning brush that is provided to be movable between a cleaning position for cleaning the substrate held by the substrate holder and a waiting position outward of the substrate held by the substrate holder, and has a cleaning surface capable of cleaning the substrate held by the substrate holder, a remover that is co...