ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,135, issued on April 15, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate treating apparatus" was invented by Hirofumi Tonai (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a spin table configured to be rotatable around a vertical axis; a rotational driving device having a grounded rotary shaft connected to a center portion of the spin table and configured to rotate the spin table in a horizontal plane; a holding mechanism having a plurality of support pins, provided on a top face of the spin table adja...