US Patent Issued to SAP on Sept. 9 for "Training of machine learning models using content masking techniques" (German Inventor)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,411, issued on Sept. 9, was assigned to SAP SE (Walldorf, Germany).

"Training of machine learning models using content masking techniques" was invented by Sohyeong Kim (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for training machine learning model is provided. The method comprises extracting texts and locations of the texts from a document, generating embeddings for the document, a first set of the embeddings characterizing a first subset of the texts and locations of the first subset of the texts and a second set of the embeddings characterizing a second subset of the texts that are masked and additional locations of the second...