US Patent Issued to SAP on Jan. 27 for "Application error log analysis and resolution using large language models and entity matching" (Singaporean Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,536,089, issued on Jan. 27, was assigned to SAP SE (Walldorf, Germany).

"Application error log analysis and resolution using large language models and entity matching" was invented by Xingce Bao (Singapore), Bee Huang Tan (Singapore), Ki In Tan (Singapore), Rajesh Vellore Arumugam (Singapore) and Yi Quan Zhou (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and computer-readable storage media for a software debugging system that leverages a LLM in combination with an entity matching model to propose solutions for mitigating errors. In some examples, the LLM is used to generate embeddings that are used to identify two or more m...