US Patent Issued to SAP on Jan. 20 for "High throughput machine learning model runtime using CPU affinity and process niceness control" (Singaporean Inventor)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,530,224, issued on Jan. 20, was assigned to SAP SE (Walldorf, Germany).

"High throughput machine learning model runtime using CPU affinity and process niceness control" was invented by Shi Xiaoyan (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and computer-readable storage media for receiving, by a request processing engine of the ML model runtime, an inference request associated with a version model (VM), and determining, by the request processing engine that a VM-specific token and a global token are available for the inference request, the VM-specific token being available from a token pool that is specific to the VM, and...