ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,534, issued on May 20, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea).

"Semiconductor photoresist composition and method of forming patterns using the composition" was invented by Seung Han (Suwon-si, South Korea), Jaehyun Kim (Suwon-si, South Korea), Kyungsoo Moon (Suwon-si, South Korea), Changsoo Woo (Suwon-si, South Korea), Seungyong Chae (Suwon-si, South Korea), Ran Namgung (Suwon-si, South Korea) and Hwansung Cheon (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, an organic acid having a vapor pressu...