US Patent Issued to Samsung SDI on Jan. 27 for "Composition for semiconductor photoresist, and pattern formation method using same" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,761, issued on Jan. 27, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea).

"Composition for semiconductor photoresist, and pattern formation method using same" was invented by Kyungsoo Moon (Suwon-si, South Korea), Eunmi Kang (Suwon-si, South Korea), Jaehyun Kim (Suwon-si, South Korea), Jimin Kim (Suwon-si, South Korea), Taeho Kim (Suwon-si, South Korea), Changsoo Woo (Suwon-si, South Korea), Hwansung Cheon (Suwon-si, South Korea), Seungyong Chae (Suwon-si, South Korea) and Seung Han (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a semiconductor photoresist composition and a method of forming patterns...