ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,292, issued on Sept. 9, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"System and method for brightfield inspection of circular rotating wafers" was invented by Shashank Shrikant Agashe (Bengaluru, India) and Gaurav Kumar (Bengaluru, India).
According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for brightfield inspection of a circular rotating wafer are provided. A method includes: acquiring a plurality of images of a circular wafer, that is rotating, by using a plurality of line cameras; obtaining a plurality of synchronized images, based on the plurality of images, by synchronizing a motion of the circular wafer...