ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,430,488, issued on Sept. 30, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Methods of designing layout of semiconductor device and methods for manufacturing semiconductor device using the same" was invented by Sungwe Cho (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of designing a layout of a semiconductor device, includes: preparing a standard cell library including information on standard cells; determining a layout of a common pattern region in consideration of a local layout effect based on the standard cell library; adding the common pattern region having a cell height that is identical to ...