US Patent Issued to SAMSUNG ELECTRONICS on Sept. 30 for "Exhaust gas processing apparatus having plasma source and substrate processing apparatus including the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,340, issued on Sept. 30, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Exhaust gas processing apparatus having plasma source and substrate processing apparatus including the same" was invented by Jaehyun Kim (Suwon-si, South Korea), Kookjin Ann (Suwon-si, South Korea), Suji Gim (Suwon-si, South Korea), Taijong Sung (Suwon-si, South Korea), Sunwoo Yook (Suwon-si, South Korea) and Young Heo (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exhaust gas processing apparatus includes a first chamber and a second chamber in parallel between a processing chamber and an exhaust pump, at least one foreline con...