US Patent Issued to SAMSUNG ELECTRONICS on Sept. 23 for "Plasma processing apparatus and semiconductor device manufacturing method" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,422, issued on Sept. 23, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Plasma processing apparatus and semiconductor device manufacturing method" was invented by Wonsuk Yang (Hwaseong-si, South Korea), Sanghun Seo (Yongin-si, South Korea), Seunghyun Chung (Yongin-si, South Korea), Myoungsoo Kim (Hwaseong-si, South Korea), Seunghun Seo (Yongin-si, South Korea), Woojin Song (Yongin-si, South Korea) and Bora Yoon (Goyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a chamber having an upper wall with a plurality of through holes and a lower wall with an exhaust hole, the...