ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,408,355, issued on Sept. 2, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Metal-insulator-metal capacitor" was invented by Jihyung Kim (Suwon-si, South Korea), Jeonghoon Ahn (Suwon-si, South Korea), Jaehee Oh (Suwon-si, South Korea), Shaofeng Ding (Suwon-si, South Korea), Wonji Park (Suwon-si, South Korea) and Jegwan Hwang (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metal-insulator-metal capacitor includes a first electrode disposed in a first region of an upper surface of a substrate, a second electrode covering the first electrode and extending to a second region surrounding an outer periphery of th...