US Patent Issued to SAMSUNG ELECTRONICS on Sept. 16 for "Semiconductor device with bit-line structure over cell region isolation film" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,419,040, issued on Sept. 16, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Semiconductor device with bit-line structure over cell region isolation film" was invented by Seok Hyun Kim (Incheon, South Korea), Young Sin Kim (Hwaseong-si, South Korea), Dong Sik Park (Suwon-si, South Korea), Jong Min Lee (Hwaseong-si, South Korea) and Joon Yong Choe (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device comprises a substrate comprising a cell region; a cell region isolation film in the substrate and extending along an outer edge of the cell region; a bit-line structure on the substrate and in...