US Patent Issued to SAMSUNG ELECTRONICS on Oct. 7 for "Semiconductor device including a macro pattern structure for monitoring of line widths" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,054, issued on Oct. 7, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Semiconductor device including a macro pattern structure for monitoring of line widths" was invented by Jungkee Choi (Hwaseong-si, South Korea), Sangwoo Park (Suwon-si, South Korea) and Woonhyuk Choi (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device may include a metal pattern in a device region of a substrate, and a macro pattern structure in a scribe lane region of the substrate. The macro pattern structure may include a plurality of types of macro patterns. Each type of macro pattern may include a color 1 pattern...