ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,969, issued on Oct. 7, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Plasma processing equipment" was invented by Seung Bo Shim (Seoul, South Korea), Doug Yong Sung (Seoul, South Korea), Young Jin Noh (Ansan-si, South Korea), Yong Woo Lee (Hwaseong-si, South Korea), Ji Soo Im (Seongnam-si, South Korea), Hyeong Mo Kang (Hwaseong-si, South Korea), Peter Byung H Han (Suwon-si, South Korea), Cheon Kyu Lee (Hwaseong-si, South Korea) and Masato Horiguchi (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Plasma processing equipment includes a chuck stage for supporting a wafer and including a lower electrode, ...