US Patent Issued to SAMSUNG ELECTRONICS on Oct. 28 for "Fluid control device and substrate processing apparatus including the same" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,013, issued on Oct. 28, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Fluid control device and substrate processing apparatus including the same" was invented by Byungchul Choi (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fluid control device includes: a fluid block having a first channel extending from an inlet to an outlet and a second channel above and in communication with the first channel, the fluid block including a bending cover configured to cover the second channel to thereby block fluid from flowing from the inlet to the outlet of the first channel; and a valve having a hollow portion, a...