ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,733, issued on Oct. 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Substrate treating apparatus" was invented by Seulgi Han (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus includes a chamber having a gate through which a substrate is loaded into the chamber and unloaded from the chamber, a gas supply unit in an upper portion in the chamber and configured to supply gas into the chamber, a spin coater in a lower portion in the chamber and including a spin chuck configured to support and rotate the substrate on an upper surface thereof and a cup portion extending around th...