ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,453,082, issued on Oct. 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Semiconductor device having a cell separation pattern in contact with the bit line contact" was invented by Kiseok Lee (Suwon-si, South Korea), Jongmin Kim (Suwon-si, South Korea), Hyo-Sub Kim (Suwon-si, South Korea), Hui-Jung Kim (Suwon-si, South Korea), Sohyun Park (Suwon-si, South Korea), Junhyeok Ahn (Suwon-si, South Korea), Chan-Sic Yoon (Suwon-si, South Korea), Myeong-Dong Lee (Suwon-si, South Korea), Woojin Jeong (Suwon-si, South Korea) and Wooyoung Choi (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device inc...