ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,453,091, issued on Oct. 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Method of fabricating integrated circuit device and method of fabricating electronic system having the same" was invented by Sangmin Kang (Hwaseong-si, South Korea), Hyungjoon Kim (Yongin-si, South Korea) and Woojin Jang (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating an integrated circuit device includes forming on a semiconductor substrate a mold stack that includes a plurality of insulating layers and a plurality of mold layers alternately arranged. A mask pattern including an opening is formed on the mold s...