US Patent Issued to SAMSUNG ELECTRONICS on Oct. 14 for "Pattern design for integrated circuits and method for inspecting the pattern design for integrated circuits" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,661, issued on Oct. 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Pattern design for integrated circuits and method for inspecting the pattern design for integrated circuits" was invented by Jong Soo Baek (Hwaseong-si, South Korea), Jin Myoung Lee (Hwaseong-si, South Korea), Min Soo Kang (Hwaseong-si, South Korea), Hyun Ah Roh (Hwaseong-si, South Korea) and Bo Young Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern design for defect inspection, the pattern design including a first floating conductive line; a second floating conductive line; and a grounded conductive line disposed betw...