ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,144, issued on Nov. 25, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"EUV photomask inspection apparatus" was invented by Garam Choi (Suwon-si, South Korea), Taejoong Kim (Hwaseong-si, South Korea), Jihoon Na (Bucheon-si, South Korea) and Changhoon Choi (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An EUV photomask inspection apparatus includes a plurality of optical systems respectively forming different confocal points in a mask structure including an EUV photomask and a pellicle on the EUV photomask. A first optical system among the plurality of optical systems includes a first light source e...