ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,478,922, issued on Nov. 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Catalytic decomposition device and integrated waste gas treatment system" was invented by Kyeongmin Baek (Hwaseong-si, South Korea), Sungmin Jang (Suwon-si, South Korea), Seongkeun Kang (Hwaseong-si, South Korea), Taehyun Kim (Asan-si, South Korea), Seongyun Ryu (Asan-si, South Korea), Byungku Yoo (Hwaseong-si, South Korea), Seungjun Lee (Hwaseong-si, South Korea), Woosung Choi (Goyang-si, South Korea), Haeyong Choi (Yongin-si, South Korea) and Joungwoo Han (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated waste gas tre...