US Patent Issued to SAMSUNG ELECTRONICS on Nov. 18 for "Scanning electron microscope image-based pitch walk inspection method and method of manufacturing semiconductor device comprising the inspection method" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,073, issued on Nov. 18, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Scanning electron microscope image-based pitch walk inspection method and method of manufacturing semiconductor device comprising the inspection method" was invented by Sung Min Nam (Suwon-si, South Korea), Jaeseung Jeong (Hwaseong-si, South Korea), Dongho Kim (Hwaseong-si, South Korea) and Seunghune Yang (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pitch walk inspection method includes obtaining a scanning electron microscope (SEM) image for a line and space (L/S) pattern formed by a multi-patterning technology (MPT), where L/S pat...