ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,089, issued on Nov. 18, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Plasma processing apparatus" was invented by Donghyeon Na (Suwon-si, South Korea), Jaebin Kim (Suwon-si, South Korea), Myeongsoo Shin (Suwon-si, South Korea), Dongseok Han (Suwon-si, South Korea), Kyungsun Kim (Suwon-si, South Korea), Namkyun Kim (Suwon-si, South Korea), Jaesung Kim (Suwon-si, South Korea) and Seungbo Shim (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a wafer support fixture in the chamber and configured to support a wafer, an upper electrode in the chamber and spaced apart fro...