US Patent Issued to SAMSUNG ELECTRONICS on Nov. 11 for "Photoresist compositions and methods of fabricating a semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,226, issued on Nov. 11, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Photoresist compositions and methods of fabricating a semiconductor device" was invented by Honggu Im (Hwaseong-si, South Korea), Sumin Kim (Suwon-si, South Korea), Yechan Kim (Hwaseong-si, South Korea), Jinjoo Kim (Seoul, South Korea), Hyunwoo Kim (Seongnam-si, South Korea), Sunghwan Park (Suwon-si, South Korea), Juhyeon Park (Hwaseong-si, South Korea), Jicheol Park (Anyang-si, South Korea), Giyoung Song (Anyang-si, South Korea) and Sukkoo Hong (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Photoresist compositions may include a pho...