US Patent Issued to SAMSUNG ELECTRONICS on Nov. 11 for "Methods of manufacturing semiconductor devices including a repeating pattern of lines and spaces" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,702, issued on Nov. 11, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Methods of manufacturing semiconductor devices including a repeating pattern of lines and spaces" was invented by Seungkyo Lee (Suwon-si, South Korea), Jongin Kang (Suwon-si, South Korea), Gyeyoung Kim (Suwon-si, South Korea), Youngwoo Kim (Suwon-si, South Korea), Yonghan Park (Suwon-si, South Korea), Woojin Jung (Suwon-si, South Korea), Seunguk Han (Suwon-si, South Korea) and Juyoung Huh (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor device includes: forming a mask layer, a first separation ...