US Patent Issued to SAMSUNG ELECTRONICS on May 27 for "Semiconductor device comprising work function metal pattern in boundary region and method for fabricating the same" (South Korean Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,467, issued on May 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-Do, South Korea).

"Semiconductor device comprising work function metal pattern in boundary region and method for fabricating the same" was invented by Ki Wook Jung (Seoul, South Korea), Dong Oh Kim (Daegu, South Korea), Seok Han Park (Hwaseong-si, South Korea), Chan Sic Yoon (Anyang-si, South Korea), Ki Seok Lee (Hwaseong-si, South Korea), Ho In Lee (Suwon-si, South Korea), Ju Yeon Jang (Hwaseong-si, South Korea), Je Min Park (Suwon-si, South Korea) and Jin Woo Hong (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device and method for ...