US Patent Issued to SAMSUNG ELECTRONICS on May 27 for "Plasma processing apparatus and methods of manufacturing semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,703, issued on May 27, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Plasma processing apparatus and methods of manufacturing semiconductor device using the same" was invented by Kyoungchon Kim (Goyang-si, South Korea), Taemin Earmme (Hwaseong-si, South Korea), Kwangnam Kim (Suwon-si, South Korea) and Jongwoo Sun (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a substrate chuck having a first region configured to support a substrate and a second region located at a lower level, a focus ring disposed on the second region and surrounding an outer circumferential s...