US Patent Issued to SAMSUNG ELECTRONICS on May 20 for "Lithography and method of fabricating semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,531, issued on May 20, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Lithography and method of fabricating semiconductor device using the same" was invented by Wooseok Kim (Yongin-si, South Korea), Noyoung Chung (Hwaseong-si, South Korea) and Byung Je Jung (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes grouping, in a first layout, pattern regions which have duplicate layout patterns including weak regions as a group, calculating defect probabilities of the pattern regions, respectively, calculating a defect frequency and a defect rate of the group based on the defect probabilities ...