ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,255, issued on May 20, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Apparatus and method for drying substrate" was invented by Sangjine Park (Suwon-si, South Korea), Jihoon Jeong (Seongnam-si, South Korea), Younghoo Kim (Yongin-si, South Korea) and Kuntack Lee (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate drying apparatus. The substrate drying apparatus may include an upper chamber body including an inlet configured to introduce a supercritical fluid into a chamber space, a lower chamber body including an outlet configured to discharge the supercritical fluid outside the chamb...