US Patent Issued to SAMSUNG ELECTRONICS on March 25 for "Methods for manufacturing semiconductor devices using MOIRE patterns" (South Korean Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,662, issued on March 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Methods for manufacturing semiconductor devices using MOIRE patterns" was invented by Woohyeok Jeong (Hwaseong-si, South Korea), Donghwan Kim (Pyeongtak-si, South Korea), Inchul Shin (Suwon-si, South Korea), Wonhyeok Jo (Daejeon, South Korea), Hyein Cho (Seoul, South Korea) and Seulgi Han (Seongnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor device may include: forming a first layer comprising a plurality of patterns, each pattern having a different respective pitch; performing exposure and de...