US Patent Issued to SAMSUNG ELECTRONICS on March 25 for "Method of manufacturing extreme ultraviolet (EUV) photomask and method and apparatus for correcting EUV photomask" (South Korean Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,647, issued on March 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Method of manufacturing extreme ultraviolet (EUV) photomask and method and apparatus for correcting EUV photomask" was invented by Jongkeun Oh (Seoul, South Korea), Sanguk Park (Yongin-si, South Korea), Gyeongcheon Jo (Hwaseong-si, South Korea) and Jongju Park (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is provided. The method includes preparing a mask blank, the mask blank including a substrate, a reflective layer disposed on the substrate for reflecting extreme ultraviolet light, and a light absorbing layer dispose...