ALEXANDRIA, Va., March 26 -- United States Patent no. 12,260,539, issued on March 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method" was invented by Minho Kim (Yongin-si, South Korea), Hakseung Han (Hwaseong-si, South Korea), Jiyoung Kim (Hwaseong-si, South Korea) and Jinback Park (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and o...