ALEXANDRIA, Va., March 26 -- United States Patent no. 12,258,494, issued on March 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Adhesive for pellicle, pellicle for photo mask and method for manufacturing the same" was invented by Mun Ja Kim (Hwaseong-si, South Korea) and Changyoung Jeong (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water."
The patent was filed on Aug. 22, 2023, under Application No. 18/236,515.
*For further information, including images, charts and tables...