ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,093, issued on June 3, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Method for obtaining an exposure data and method for manufacturing an exposure mask using the same" was invented by Soeun Shin (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for obtaining exposure data may be provided. MTO (Mask Tape Out) design data for a mask pattern may be received. A mask data preparation operation with respect to the MTO design data may be performed to obtain exposure data. Two-dimensional contours of a plurality of types of test patterns in an exposure mask may be extracted through simulation using a mas...