US Patent Issued to SAMSUNG ELECTRONICS on June 17 for "Method and apparatus for reference symbol pattern adaptation" (California, Texas Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,335,091, issued on June 17, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Method and apparatus for reference symbol pattern adaptation" was invented by Caleb K. Lo (San Jose, Calif.), Jeongho Jeon (San Jose, Calif.) and Gilwon Lee (McKinney, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "Machine learning (ML) adaptation of any one of reference signal (RS) temporal density, RS frequency density, RS spatial density, or number of transmission/reception points (TRPs) that transmit RS provides configuration of lower RS densities or fewer TRPs that transmit RS without significant loss of throughput in appropriate circumstances. ...