US Patent Issued to SAMSUNG ELECTRONICS on June 17 for "Dual resolution spectrometer, and spectrometric measurement apparatus and method using the spectrometer" (South Korean Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,164, issued on June 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Dual resolution spectrometer, and spectrometric measurement apparatus and method using the spectrometer" was invented by Sunhong Jun (Suwon-sl, South Korea), Jaeho Kim (Suwon-si, South Korea) and Younghoon Sohn (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dual resolution spectrometer includes a slit plate comprising a slit receiving light reflected from a measurement target. The slit plate directs the light reflected from the measurement target to a first mirror. The first mirror reflects light from the slit to a diffraction grat...