ALEXANDRIA, Va., June 18 -- United States Patent no. 12,328,966, issued on June 10, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Substrate for optical device, method of manufacturing the same, optical device including the substrate for optical device, method of manufacturing the same, and electronic apparatus including optical device" was invented by Changyoung Park (Yongin-si, South Korea) and Sanghun Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a high-quality substrate including a silicon layer, a multilayer buffer layer on the silicon layer, and an indium phosphide (InP) layer on the multilayer buffer layer, wherein a crystal growth direction...