ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,712, issued on June 10, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"High voltage power supply apparatus and plasma etching equipment having the same" was invented by Jihwan Kim (Hwaseong-si, South Korea), Hyunbae Kim (Yongin-si, South Korea), Hongseung Cho (Hwaseong-si, South Korea), Seungbo Shim (Seoul, South Korea) and Sungyeol Kim (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A high voltage power supply apparatus includes a high voltage direct current voltage source, a power switch configured to apply an output of the high voltage direct current voltage source to process equipment, and a sensing...