ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,709, issued on June 10, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (South Korea).
"Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the same" was invented by Dong-Hyub Lee (Seoul, South Korea), Dougyong Sung (Seoul, South Korea), Je-Hun Woo (Suwon-si, South Korea), Bongseong Kim (Yongin-si, South Korea), Juho Lee (Suwon-si, South Korea), Yun-Kwang Jeon (Seoul, South Korea) and Junghyun Cho (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the inventive concepts provide antennas, plasma generating circuits, plasma processing apparatus, ...