US Patent Issued to SAMSUNG ELECTRONICS on July 29 for "Method and device for supporting double connection of RRC inactivation mode in next generation mobile communication system" (South Korean Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,376,185, issued on July 29, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Method and device for supporting double connection of RRC inactivation mode in next generation mobile communication system" was invented by Sangyeob Jung (Suwon-si, South Korea), Soenghun Kim (Suwon-si, South Korea), Donggun Kim (Suwon-si, South Korea), Himke Van Der Velde (Suwon-si, South Korea), Anil Agiwal (Suwon-si, South Korea) and Jungsoo Jung (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are: a communication technique for merging, with IoT technology, a 5G communication system for supporting a data transmission rate...