ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,200, issued on July 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Supercritical fluid processing apparatus and substrate processing system including the same" was invented by Seohyun Kim (Hwaseong-si, South Korea), Ohchel Kwon (Hwaseong-si, South Korea), Sangwoo Kim (Gimhae-si, South Korea), Youngchan Kim (Hwaseong-si, South Korea), Hyunchul Kim (Hwaseong-si, South Korea), Hyunwoo Nho (Yongin-si, South Korea), Jaeseong Ryu (Hwaseong-si, South Korea), Seungbu Baek (Hwaseong-si, South Korea), Yongmyung Jun (Hwaseong-si, South Korea), Hyeongkwon Jeong (Jeollanam-do, South Korea) and Daewoong Choi (Suwon-si, South Korea).

According to the abstract* releas...