ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,216, issued on July 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Plasma processing apparatus and semiconductor fabrication method using the same" was invented by Daehyun Lee (Suwon-si, South Korea), Youngil Kang (Hwaseong-si, South Korea), Youngeun Kim (Seoul, South Korea), Jaesuk Kim (Hwaseong-si, South Korea), Minji Park (Seoul, South Korea), Sangwook Park (Seongnam-si, South Korea), Dongho Shin (Suwon-si, South Korea), Dongyun Yeo (Seoul, South Korea), Chunghun Lee (Hwaseong-si, South Korea) and Kyoung-Mi Choi (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a plasma processing appar...