ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,911, issued on July 15, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-Do, South Korea).
"Method of calculating thickness of graphene layer and method of measuring content of silicon carbide by using XPS" was invented by Eunkyu Lee (Yongin-si, South Korea), Yeonchoo Cho (Seongnam-si, South Korea), Sangwon Kim (Seoul, South Korea), Kyung-Eun Byun (Seongnam-si, South Korea), Hyunjae Song (Hwaseong-si, South Korea) and Hyeonjin Shin (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of calculating a thickness of a graphene layer and a method of measuring a content of silicon carbide, by using X-ray photoelectron spec...