ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,473, issued on Jan. 27, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Semiconductor device including pad pattern" was invented by Minsu Choi (Suwon-si, South Korea) and Soyeong Kim (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a substrate; an active region including a first impurity region and a second impurity region spaced apart from the first impurity region; an isolation region defining the active region; a gate structure intersecting the active region and extending in a first direction parallel to the substrate; a first pad pattern disposed on the first impurity re...