US Patent Issued to SAMSUNG ELECTRONICS on Jan. 13 for "Methods for VFET cell placement and cell architecture" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,524,595, issued on Jan. 13, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Methods for VFET cell placement and cell architecture" was invented by Jung Ho Do (Hwaseong-si, South Korea) and Seung Hyun Song (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cell architecture and a method for placing a plurality of cells to form the cell architecture are provided. The cell architecture includes at least a 1st cell and a 2nd cell placed next to each other in a cell width direction, wherein the 1st cell includes a one-fin connector which is formed around a fin among a plurality of fins of the 1st cell, and conne...